The symposium is an opportunity to hear about the latest solutions to practical problems in industrial design and production engineering highlighting optical principles, metrology and more

A symposium to highlight new optical principles and systems for metrology and more

 

The SPIE Optical Metrology will take place in Munich, Germany, on June 26-29, 2017. The organizer, SPIE, is an no-profit international society advancing an interdisciplinary approach to the science and application of light.

In brief, the symposium will highlight new optical principles and systems for metrology, video metrics and machine vision with applications in industrial design, as well as production engineering, process monitoring, maintenance support, biotechnology, vehicle navigation, multimedia technology, architecture, archaeology and arts.

In other words, the main goals of the conference are:

  • Take advantage of this unique opportunity to hear about the latest solutions to practical problems in industrial design and production engineering.
  • Learn about recent advances in using optical technologies to preserve our shared cultural heritage.
  • Find out about new approaches that push optical principles of measurement and testing at the macro, micro- and nanoscales to the forefront of metrology.
  • Exchange new ideas, address your shared concerns and get access to information not yet published in the topical areas.
  • Share your research with other engineers, scientists, researchers, and managers.

The conference chairs are Luca Pezzati, CNR, the coordinator of E-RIHS, and Piotr Targowski, NCU, Poland.

In order to have further information, see the SPIE website.